Title
Sputter deposition of <tex>$Mg_{x}Al_{y}O_{z}$</tex> thin films in a dual-magnetron device : a multi-species Monte Carlo model Sputter deposition of <tex>$Mg_{x}Al_{y}O_{z}$</tex> thin films in a dual-magnetron device : a multi-species Monte Carlo model
Author
Faculty/Department
Faculty of Sciences. Chemistry
Publication type
article
Publication
Bristol ,
Subject
Physics
Chemistry
Source (journal)
New journal of physics / Institute of Physics; German Physical Society. - Bristol
Volume/pages
14(2012) :7 , 21 p.
ISSN
1367-2630
Article Reference
073043
Carrier
E-only publicatie
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
Abstract
A multi-species Monte Carlo (MC) model, combined with an analytical surface model, has been developed in order to investigate the general plasma processes occurring during the sputter deposition of complex oxide films in a dual-magnetron sputter deposition system. The important plasma species, such as electrons, Ar+ ions, fast Ar atoms and sputtered metal atoms (i.e. Mg and Al atoms) are described with the so-called multi-species MC model, whereas the deposition of MgxAlyOz films is treated by an analytical surface model. Targetsubstrate distances for both magnetrons in the dual-magnetron setup are varied for the purpose of growing stoichiometric complex oxide thin films. The metal atoms are sputtered from pure metallic targets, whereas the oxygen flux is only directed toward the substrate and is high enough to obtain fully oxidized thin films but low enough to avoid target poisoning. The calculations correspond to typical experimental conditions applied to grow these complex oxide films. In this paper, some calculation results are shown, such as the densities of various plasma species, their fluxes toward the targets and substrate, the deposition rates, as well as the film stoichiometry. Moreover, some results of the combined model are compared with experimental observations. Note that this is the first complete model, which can be applied for large and complicated magnetron reactor geometries, such as dual-magnetron configurations. With this model, we are able to describe all important plasma species as well as the deposition process. It can also be used to predict film stoichiometries of complex oxide films on the substrate.
Full text (open access)
https://repository.uantwerpen.be/docman/irua/31923c/1a23d502.pdf
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