Title
Non-additive sputtering of niobium and tantalum as neutral and charged clusters Non-additive sputtering of niobium and tantalum as neutral and charged clusters
Author
Faculty/Department
Faculty of Sciences. Chemistry
Publication type
article
Publication
Amsterdam ,
Subject
Physics
Engineering sciences. Technology
Source (journal)
Nuclear instruments and methods in physics research: B: beam interactions with materials and atoms. - Amsterdam
Volume/pages
203(2003) , p. 164-171
ISSN
0168-583X
ISI
000182624600027
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
Abstract
An analysis of available literature data on both positive ion emission from Nb and Ta bombarded with 6 keV/atom. Au-m(-) atomic and molecular ions (m = 1, 2, 3) and positive, ionization probabilities of Nb-n and Ta-n neutral clusters sputtered from the same metals by 5 keV Ar+ ions has been conducted. Dependencies of cluster yields Y-n,Y-m (regardless of charge state) on the number of atoms n in a sputtered particles were found to follow a power law as Y-n,Y-m similar to n(-sigmam) where am decreases with an increase of m. A non-linear enhancement of yields for large Nb-n(+) and Ta-n(+) cluster ions (n > 4) appeared to, be a result of a non-additive process of sputtering rather than of a non-additive process of,their ionization. A manifestation of the non-additive sputtering in kinetic energy distribution of secondary ions was found to be different for atomic and cluster ions. (C) 2003 Elsevier Science B.V. All rights reserved.
E-info
https://repository.uantwerpen.be/docman/iruaauth/735e0c/c394402.pdf
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