Publication
Title
Non-additive sputtering of niobium and tantalum as neutral and charged clusters
Author
Abstract
An analysis of available literature data on both positive ion emission from Nb and Ta bombarded with 6 keV/atom. Au-m(-) atomic and molecular ions (m = 1, 2, 3) and positive, ionization probabilities of Nb-n and Ta-n neutral clusters sputtered from the same metals by 5 keV Ar+ ions has been conducted. Dependencies of cluster yields Y-n,Y-m (regardless of charge state) on the number of atoms n in a sputtered particles were found to follow a power law as Y-n,Y-m similar to n(-sigmam) where am decreases with an increase of m. A non-linear enhancement of yields for large Nb-n(+) and Ta-n(+) cluster ions (n > 4) appeared to, be a result of a non-additive process of sputtering rather than of a non-additive process of,their ionization. A manifestation of the non-additive sputtering in kinetic energy distribution of secondary ions was found to be different for atomic and cluster ions. (C) 2003 Elsevier Science B.V. All rights reserved.
Language
English
Source (journal)
Nuclear instruments and methods in physics research: B: beam interactions with materials and atoms. - Amsterdam
Publication
Amsterdam : 2003
ISSN
0168-583X
Volume/pages
203(2003), p. 164-171
ISI
000182624600027
Full text (Publishers DOI)
Full text (publishers version - intranet only)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 03.01.2013
Last edited 17.05.2017
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