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Title
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Non-additive sputtering of niobium and tantalum as neutral and charged clusters
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Author
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Abstract
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| An analysis of available literature data on both positive ion emission from Nb and Ta bombarded with 6 keV/atom. Au-m(-) atomic and molecular ions (m = 1, 2, 3) and positive, ionization probabilities of Nb-n and Ta-n neutral clusters sputtered from the same metals by 5 keV Ar+ ions has been conducted. Dependencies of cluster yields Y-n,Y-m (regardless of charge state) on the number of atoms n in a sputtered particles were found to follow a power law as Y-n,Y-m similar to n(-sigmam) where am decreases with an increase of m. A non-linear enhancement of yields for large Nb-n(+) and Ta-n(+) cluster ions (n > 4) appeared to, be a result of a non-additive process of sputtering rather than of a non-additive process of,their ionization. A manifestation of the non-additive sputtering in kinetic energy distribution of secondary ions was found to be different for atomic and cluster ions. (C) 2003 Elsevier Science B.V. All rights reserved. |
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Language
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English
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Source (journal)
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Nuclear instruments and methods in physics research: B: beam interactions with materials and atoms. - Amsterdam
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Publication
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Amsterdam
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2003
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ISSN
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0168-583X
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DOI
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10.1016/S0168-583X(02)02212-7
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Volume/pages
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203
(2003)
, p. 164-171
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ISI
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000182624600027
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Full text (Publisher's DOI)
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Full text (publisher's version - intranet only)
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