| Title |
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EFTEM study of plasma etched low-k Si-O-C dielectrics
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| Author |
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| Abstract |
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| Language |
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English
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| Source (journal) |
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CONFERENCE SERIES- INSTITUTE OF PHYSICS | |
| Source (book) |
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Royal-Microscopical-Society Conference on Microscopy of Semiconducting, Materials, MAR 25-29, 2001, UNIV OXFORD, OXFORD, ENGLAND | |
| Publication |
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2001
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| ISBN |
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0-7503-0818-4
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| Volume/pages |
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169(2001), p. 415-418
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| ISI |
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000176465200088
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