| Title |
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Plasma-enhanced chemical-vapor-deposition of amorphous films
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| Author |
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| Abstract |
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| Language |
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English
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| Source (journal) |
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Journal of non-crystalline solids. - Amsterdam | |
| Source (book) |
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15th International Conference on Amorphous Semiconductors - Science and, Technology, SEP 06-10, 1993, CAMBRIDGE, ENGLAND | |
| Publication |
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Amsterdam : 1993
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| ISSN |
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0022-3093
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| Volume/pages |
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166:Part 2(1993), p. 1195-1198
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| ISI |
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A1993MT78200133
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