Publication
Title
Defects in high-dose oxygen implanted silicon : a TEM study
Author
Abstract
Language
English
Source (journal)
Vacuum: the international journal and abstracting service for vacuum science and technology. - Oxford
Source (book)
1ST SIOMX WORKSHOP ( SEPARATION BY IMPLANTATION OF OXYGEN ) ( SWI-88 ), NOV 07-08, 1988, UNIV SURREY, GUILDFORD, ENGLAND
Publication
Oxford : 1991
ISSN
0042-207X
Volume/pages
42:5-6(1991), p. 367-369
ISI
A1991EV61700007
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 03.01.2013
Last edited 14.10.2018
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