Title
Plasma deposition of amorphous as-s filmsPlasma deposition of amorphous as-s films
Author
Faculty/Department
Faculty of Applied Economics
Research group
Faculteit Toegepaste Economische Wetenschappen
Publication type
article
Publication
Amsterdam,
Subject
Physics
Source (journal)
Journal of non-crystalline solids. - Amsterdam
Source (book)
14TH INTERNATIONAL CONF ON AMORPHOUS SEMICONDUCTORS - SCIENCE AND, TECHNOLOGY ( ICAS-14 ), AUG 19-23, 1991, GARMISCH PARTENKIRCHEN, GERMANY
Volume/pages
137(1991):Part 2, p. 1001-1004
ISSN
0022-3093
ISI
A1991GX22800089
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
Abstract
Hydrogenated AsxS1-x thin layers have been prepared by plasma decomposition of the constituent hydrides. Microprobe analysis shows that the chemical composition and homogeneity depend not only on the AsH3/H2S ratio but also on the gas pressure. Infrared and Raman spectra reveal the presence of As4S4 and As4S3 molecular units in the structure of As rich samples. On light exposure photobleaching is observed in samples with overstoichiometry of As (x greater-than-or-equal-to 0.5).
E-info
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