Publication
Title
Toward electron exit wave tomography of amorphous materials at atomic resolution
Author
Abstract
We suggest to use electron exit wave phase for tomographic reconstruction of structure of Au-doped amorphous Si with atomic resolution. In the present theoretical investigation into the approach it is found that the number of projections and the accuracy of defocus in the focal series restoration are the main factors that contribute to the final resolution. Although resolution is ultimately limited by these factors, phase shifts in the exit wave are sufficient to identify the position of Au atoms in an amorphous Si needle model, even when only 19 projections with defocus error of 4 nm are used. Electron beam damage will probably further limit the resolution of such tomographic reconstructions, however beam damage can be mitigated using lower accelerating voltages. (c) 2011 Elsevier B.V. All rights reserved.
Language
English
Source (journal)
Journal of alloys and compounds. - Amsterdam
Publication
Amsterdam : 2012
ISSN
0925-8388
Volume/pages
536:s:[1](2012), p. S94-S98
ISI
000310837500022
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 04.02.2013
Last edited 14.09.2017
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