Publication
Title
Effect of deposition rate on the microstructure of electron beam evaporated nanocrystalline palladium thin films
Author
Abstract
The influence of the deposition rate on the formation of growth twins in nanocrystalline Pd films deposited by electron beam evaporation is investigated using transmission electron microscopy. Statistical measurements prove that twin boundary (TB) density and volume fraction of grains containing twins increase with increasing deposition rate. A clear increase of the dislocation density was observed for the highest deposition rate of 5 Å/s, caused by the increase of the internal stress building up during deposition. Based on crystallographic orientation indexation using transmission electron microscopy, it can be concluded that a {111} crystallographic texture increases with increasing deposition rate even though the {101} crystallographic texture remains dominant. Most of the TBs are fully coherent without any residual dislocations. However, for the highest deposition rate (5 Å/s), the coherency of the TBs decreases significantly as a result of the interaction of lattice dislocations emitted during deposition with the growth TBs. The analysis of the grain boundary character of different Pd films shows that an increasing fraction of high angle grain boundaries with misorientation angles around 5565° leads to a higher potential for twin formation.
Language
English
Source (journal)
Thin solid films : an international journal on the science and technology of thin and thick films. - Lausanne, 1967, currens
Publication
Lausanne : 2013
ISSN
0040-6090 [print]
1879-2731 [online]
DOI
10.1016/J.TSF.2013.05.083
Volume/pages
539 (2013) , p. 145-150
ISI
000321111100025
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Project info
Understanding nanocrystalline mechanical behaviour from structural investigations.
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identifier
Creation 30.07.2013
Last edited 09.10.2023
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