Title
Effect of deposition rate on the microstructure of electron beam evaporated nanocrystalline palladium thin films
Author
Faculty/Department
Faculty of Sciences. Physics
Publication type
article
Publication
Lausanne ,
Subject
Physics
Source (journal)
Thin solid films: an international journal on the science and technology of thin and thick films. - Lausanne
Volume/pages
539(2013) , p. 145-150
ISSN
0040-6090
ISI
000321111100025
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
Abstract
The influence of the deposition rate on the formation of growth twins in nanocrystalline Pd films deposited by electron beam evaporation is investigated using transmission electron microscopy. Statistical measurements prove that twin boundary (TB) density and volume fraction of grains containing twins increase with increasing deposition rate. A clear increase of the dislocation density was observed for the highest deposition rate of 5 Å/s, caused by the increase of the internal stress building up during deposition. Based on crystallographic orientation indexation using transmission electron microscopy, it can be concluded that a {111} crystallographic texture increases with increasing deposition rate even though the {101} crystallographic texture remains dominant. Most of the TBs are fully coherent without any residual dislocations. However, for the highest deposition rate (5 Å/s), the coherency of the TBs decreases significantly as a result of the interaction of lattice dislocations emitted during deposition with the growth TBs. The analysis of the grain boundary character of different Pd films shows that an increasing fraction of high angle grain boundaries with misorientation angles around 5565° leads to a higher potential for twin formation.
E-info
https://repository.uantwerpen.be/docman/iruaauth/0dbcf9/9c611b337b5.pdf
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