Title
Apparent and steady-state etch rates in thin film etching and under-etching of microstructures : 1: modellingApparent and steady-state etch rates in thin film etching and under-etching of microstructures : 1: modelling
Author
Faculty/Department
Faculty of Applied Engineering Sciences
Publication type
article
Publication
Bristol,
Subject
Engineering sciences. Technology
Source (journal)
Journal of micromechanics and microengineering. - Bristol
Volume/pages
(2010):20, p. 1-6
ISSN
0960-1317
ISI
000277305000033
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Abstract
A general etch rate model is proposed that allows accurate etch rate calculations out of typical ex situ etch rate experiments. This model takes into account the influence of an incubation period during the initial stage of the etching process and the influence of a decreasing etch rate during the rinsing period. Expressions for the apparent etch rate and steady-state etch rate are proposed. This paper is the first part of a set of two. In part II, experimental etch data are obtained, confirming the proposed etch rate model in this work.
E-info
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