Publication
Title
Apparent and steady-state etch rates in thin film etching and under-etching of microstructures : 1: modelling
Author
Abstract
A general etch rate model is proposed that allows accurate etch rate calculations out of typical ex situ etch rate experiments. This model takes into account the influence of an incubation period during the initial stage of the etching process and the influence of a decreasing etch rate during the rinsing period. Expressions for the apparent etch rate and steady-state etch rate are proposed. This paper is the first part of a set of two. In part II, experimental etch data are obtained, confirming the proposed etch rate model in this work.
Language
English
Source (journal)
Journal of micromechanics and microengineering. - Bristol
Publication
Bristol : 2010
ISSN
0960-1317
Volume/pages
20(2010), p. 1-6
ISI
000277305000033
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Publication type
Subject
External links
Web of Science
Record
Identification
Creation 25.09.2013
Last edited 13.11.2017