Publication
Title
Formation of a nanoscale capping layer on photoresist lines with an inductively coupled plasma : a modeling investigation
Author
Abstract
Language
English
Source (journal)
Plasma processes and polymers. - Weinheim
Publication
Weinheim : 2014
ISSN
1612-8850
Volume/pages
11:1(2014), p. 52-62
ISI
000330588800006
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Project info
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 04.04.2014
Last edited 06.07.2018
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