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Title
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Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors
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Author
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Abstract
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| In metallized film capacitors, there exists an air gap of about 0.2 μm between the films, with a pressure ranging generally from 130 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Monte Carlo collision simulation method to study the discharge properties in this direct-current microdischarge with 0.2 μm gap in a range of different voltages and pressures. The discharge process is significantly different from a conventional high pressure discharge. Indeed, the high electric field due to the small gap sustains the discharge by field emission. At low applied voltage (~15 V), only the electrons are generated by field emission, while both electrons and ions are generated as a stable glow discharge at medium applied voltage (~50 V). At still higher applied voltage (~100 V), the number of electrons and ions rapidly multiplies, the electric field reverses, and the discharge changes from a glow to an arc regime. |
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Language
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English
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Source (journal)
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New journal of physics / Institute of Physics [Londen]; German Physical Society. - Bristol
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Publication
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Bristol
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2014
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ISSN
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1367-2630
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DOI
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10.1088/1367-2630/16/11/113036
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Volume/pages
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16
(2014)
, 11 p.
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Article Reference
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113036
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ISI
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000346763400006
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Medium
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E-only publicatie
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Full text (Publisher's DOI)
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Full text (open access)
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