Publication
Title
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching
Author
Abstract
Language
English
Source (journal)
Journal of physics: D: applied physics. - London
Publication
London : 2015
ISSN
0022-3727
Volume/pages
48:2(2015), 9 p.
Article Reference
025202
ISI
000347980100011
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (open access)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 16.12.2014
Last edited 03.08.2018
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