Publication
Title
Cryogenic etching of silicon with inductively coupled plasmas: a combined modelling and experimental study
Author
Abstract
Language
English
Source (journal)
Journal of physics: D: applied physics. - London
Publication
London : 2015
ISSN
0022-3727
Volume/pages
48:15(2015), 8 p.
Article Reference
155204
ISI
000351856600009
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (open access)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Project info
Physical chemistry of plasma-surface interaction (PSI).
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 30.03.2015
Last edited 14.05.2018
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