Publication
Title
Effects of feedstock availability on the negative ion behavior in a inductively coupled plasma
Author
Abstract
Language
English
Source (journal)
Journal of applied physics / American Institute of Physics. - New York, N.Y., 1937, currens
Publication
New York, N.Y. : American Institute of Physics, 2015
ISSN
0021-8979 [print]
1089-7550 [online]
Volume/pages
118:3(2015), 18 p.
Article Reference
033301
ISI
000358429200004
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (open access)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Project info
Computer modeling and experimental validation for plasmas used for etching in the microelectronics industry.
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 11.08.2015
Last edited 09.05.2018
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