Publication
Title
Fluid simulation of the bias effect in inductive/capacitive discharges
Author
Abstract
Language
English
Source (journal)
Journal of vacuum science and technology: A: vacuum surfaces and films. - New York, N.Y., 1983, currens
Publication
New York, N.Y. : 2015
ISSN
0734-2101
Volume/pages
33:6(2015), 13 p.
Article Reference
061303
ISI
000365503800020
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (open access)
UAntwerpen
Faculty/Department
Research group
Project info
Computer modeling and experimental validation for plasmas used for etching in the microelectronics industry.
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 19.08.2015
Last edited 17.12.2018
To cite this reference