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Title
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Molecular dynamics simulations of supported metal nanocatalyst formation by plasma sputtering
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Author
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Abstract
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| Magnetron sputtering is a widely used physical vapor deposition technique for deposition and formation of nanocatalyst thin films and clusters. Nevertheless, so far only few studies investigated this formation process at the fundamental level. We here review atomic scale molecular dynamics simulations aimed at elucidating the nanocatalyst growth process through magnetron sputtering. We first introduce the basic magnetron sputtering background and machinery of molecular dynamics simulations, and then describe the studies conducted in this field so far. We also present a perspective view on how the field may be developed further. |
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Language
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English
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Source (journal)
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Catalysis today. - Amsterdam
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Publication
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Amsterdam
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2015
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ISSN
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0920-5861
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DOI
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10.1016/J.CATTOD.2015.02.004
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Volume/pages
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256
:1
(2015)
, p. 3-12
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ISI
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000360085300002
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Full text (Publisher's DOI)
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Full text (open access)
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Full text (publisher's version - intranet only)
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