Publication
Title
Molecular dynamics simulations of supported metal nanocatalyst formation by plasma sputtering
Author
Abstract
Magnetron sputtering is a widely used physical vapor deposition technique for deposition and formation of nanocatalyst thin films and clusters. Nevertheless, so far only few studies investigated this formation process at the fundamental level. We here review atomic scale molecular dynamics simulations aimed at elucidating the nanocatalyst growth process through magnetron sputtering. We first introduce the basic magnetron sputtering background and machinery of molecular dynamics simulations, and then describe the studies conducted in this field so far. We also present a perspective view on how the field may be developed further.
Language
English
Source (journal)
Catalysis today. - Amsterdam
Publication
Amsterdam : 2015
ISSN
0920-5861
Volume/pages
256:1(2015), p. 3-12
ISI
000360085300002
Full text (Publisher's DOI)
Full text (open access)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 14.09.2015
Last edited 12.06.2017
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