Title
Molecular dynamics simulations of supported metal nanocatalyst formation by plasma sputtering Molecular dynamics simulations of supported metal nanocatalyst formation by plasma sputtering
Author
Faculty/Department
Faculty of Sciences. Chemistry
Publication type
article
Publication
Amsterdam ,
Subject
Chemistry
Source (journal)
Catalysis today. - Amsterdam
Volume/pages
256(2015) :1 , p. 3-12
ISSN
0920-5861
ISI
000360085300002
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
Abstract
Magnetron sputtering is a widely used physical vapor deposition technique for deposition and formation of nanocatalyst thin films and clusters. Nevertheless, so far only few studies investigated this formation process at the fundamental level. We here review atomic scale molecular dynamics simulations aimed at elucidating the nanocatalyst growth process through magnetron sputtering. We first introduce the basic magnetron sputtering background and machinery of molecular dynamics simulations, and then describe the studies conducted in this field so far. We also present a perspective view on how the field may be developed further.
E-info
https://repository.uantwerpen.be/docman/iruaauth/df4d08/a0e56c5c7e5.pdf
Full text (open access)
https://repository.uantwerpen.be/docman/irua/8ab8d2/10720.pdf
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