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Title
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Enhancement of the stability of fluorine atoms on defective graphene and at graphene/fluorographene interface
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Author
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Abstract
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| Fluorinated graphene is one of the most important derivatives of graphene and has been found to have great potential in optoelectronic and photonic nanodevices. However, the stability of F atoms on fluorinated graphene under different conditions, which is essential to maintain the desired properties of fluorinated graphene, is still unclear. In this work, we investigate the diffusion of F atoms on pristine graphene, graphene with defects, and at graphene/fluorographene interfaces by using density functional theory calculations. We find that an isolated F atom diffuses easily on graphene, but those F atoms can be localized by inducing vacancies or absorbates in graphene and by creating graphene/fluorographene interfaces, which would strengthen the binding energy of F atoms on graphene and increase the diffusion energy barrier of F atoms remarkably. |
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Language
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English
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Source (journal)
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ACS applied materials and interfaces. - -
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Publication
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2015
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ISSN
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1944-8244
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DOI
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10.1021/ACSAMI.5B04319
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Volume/pages
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7
:35
(2015)
, p. 19659-19665
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ISI
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000361252400018
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Pubmed ID
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26302240
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Full text (Publisher's DOI)
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Full text (open access)
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