Publication
Title
A comparative study of capacitively coupled HBr/He, HBr/Ar plasmas for etching applications : numerical investigation by fluid model
Author
Abstract
Language
English
Source (journal)
Physics of plasmas. - Woodbury, N.Y.
Publication
Woodbury, N.Y. : 2015
ISSN
1070-664X
Volume/pages
22:10(2015), 9 p.
Article Reference
103520
ISI
000364403600115
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (open access)
UAntwerpen
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 09.12.2015
Last edited 08.10.2018
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