Publication
Title
A parametric model for reactive high-power impulse magnetron sputtering of films
Author
Abstract
Language
English
Source (journal)
Journal of physics: D: applied physics. - London
Publication
London : 2016
ISSN
0022-3727
Volume/pages
49:5(2016), 18 p.
Article Reference
055202
ISI
000368944100016
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (open access)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 09.01.2016
Last edited 11.02.2018
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