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Title
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Special issue of papers by plenary and topical invited lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 510 July 2015, Antwerp, Belgium : introduction
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Author
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Language
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English
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Source (journal)
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Plasma chemistry and plasma processing. - New York, N.Y., 1981, currens
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Publication
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New york
:
Springer
,
2016
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ISSN
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0272-4324
[print]
1572-8986
[online]
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DOI
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10.1007/S11090-015-9691-0
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Volume/pages
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36
:1
(2016)
, p. 1-2
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ISI
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000370720800001
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Full text (Publisher's DOI)
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Full text (publisher's version - intranet only)
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