Title Tunable stress induced magnetic domain configuration in FePt thin films Author Álvarez, N.R. Vázquez Montalbetti, M.E. Gómez, J.E. Moya Riffo, A.E. Vicente Álvarez, M.A. Goovaerts, E. Butera, A. Faculty/Department Faculty of Sciences. Physics Publication type article Publication 2015 London , 2015 Subject Physics Source (journal) Journal of physics: D: applied physics. - London Volume/pages 48(2015) :40 , 10 p. ISSN 0022-3727 0022-3727 Article Reference 405003 ISI 000362006400004 Carrier E-only publicatie Target language English (eng) Full text (Publishers DOI) Affiliation University of Antwerp Abstract We present a study of the magnetic properties of chemically disordered ferromagnetic FePt films of 100 nm thickness that have been grown by sputtering with different Ar pressures ($3\ \text{mTorr}\leqslant {{P}_{\text{Ar}}}\leqslant 13$ mTorr). We found that the residual stress can be controlled by the sputtering pressure, which in turn allows to tune the perpendicular magnetic anisotropy due to magnetoelastic effects. Films deposited at lower Ar pressures display an in-plane compressive stress that favors an out of plane component of the magnetization and the formation of a magnetic domain structure in the form of stripes. For higher pressures the stress is relaxed and the magnetic configuration changes to planar domains. These results show the possibility to accurately tune the initial magnetic state in films with potential applications in magnetoelectrically coupled devices. E-info https://repository.uantwerpen.be/docman/iruaauth/3ffd43/131264.pdf Full text (open access) https://repository.uantwerpen.be/docman/irua/753e23/131264.pdf E-info http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000362006400004&DestLinkType=RelatedRecords&DestApp=ALL_WOS&UsrCustomerID=ef845e08c439e550330acc77c7d2d848 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000362006400004&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=ef845e08c439e550330acc77c7d2d848 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000362006400004&DestLinkType=CitingArticles&DestApp=ALL_WOS&UsrCustomerID=ef845e08c439e550330acc77c7d2d848 Handle