Title
Tunable stress induced magnetic domain configuration in FePt thin films Tunable stress induced magnetic domain configuration in FePt thin films
Author
Faculty/Department
Faculty of Sciences. Physics
Publication type
article
Publication
London ,
Subject
Physics
Source (journal)
Journal of physics: D: applied physics. - London
Volume/pages
48(2015) :40 , 10 p.
ISSN
0022-3727
0022-3727
Article Reference
405003
Carrier
E-only publicatie
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
Abstract
We present a study of the magnetic properties of chemically disordered ferromagnetic FePt films of 100 nm thickness that have been grown by sputtering with different Ar pressures ($3\ \text{mTorr}\leqslant {{P}_{\text{Ar}}}\leqslant 13$ mTorr). We found that the residual stress can be controlled by the sputtering pressure, which in turn allows to tune the perpendicular magnetic anisotropy due to magnetoelastic effects. Films deposited at lower Ar pressures display an in-plane compressive stress that favors an out of plane component of the magnetization and the formation of a magnetic domain structure in the form of stripes. For higher pressures the stress is relaxed and the magnetic configuration changes to planar domains. These results show the possibility to accurately tune the initial magnetic state in films with potential applications in magnetoelectrically coupled devices.
E-info
https://repository.uantwerpen.be/docman/iruaauth/3ffd43/131264.pdf
Full text (open access)
https://repository.uantwerpen.be/docman/irua/753e23/131264.pdf
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