Publication
Title
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon
Author
Abstract
Language
English
Source (journal)
Journal of physics: D: applied physics. - London
Publication
London : 2016
ISSN
0022-3727
Volume/pages
49:24(2016), p. 1-6
ISI
000377427100020
Full text (Publisher's DOI)
Full text (open access)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
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