Publication
Title
Elucidating the effects of gas flow rate on an inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation
Author
Abstract
Language
English
Source (journal)
Journal of physics: D: applied physics. - London
Publication
London : 2016
ISSN
0022-3727
Volume/pages
49:38(2016), 5 p.
Article Reference
385201
ISI
000384095900011
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (open access)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 30.08.2016
Last edited 07.02.2018
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