Publication
Title
Modeling and tackling resistivity scaling in metal nanowires
Author
Abstract
Language
English
Source (journal)
International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]. - Piscataway, NJ
Source (book)
International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 09-11, 2015, Washington, DC
Publication
New york : Ieee, 2015
ISBN
978-1-4673-7860-4
Volume/pages
(2015), p. 222-225
ISI
000380542400057
Full text (open access)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 02.09.2016
Last edited 07.02.2018
To cite this reference