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Title
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A nanofabricated, monolithic, path-separated electron interferometer
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Author
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Abstract
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| Progress in nanofabrication technology has enabled the development of numerous electron optic elements for enhancing image contrast and manipulating electron wave functions. Here, we describe a modular, self-aligned, amplitude-division electron interferometer in a conventional transmission electron microscope. The interferometer consists of two 45-nm-thick silicon layers separated by 20 mu m. This interferometer is fabricated from a single-crystal silicon cantilever on a transmission electron microscope grid by gallium focused-ion-beam milling. Using this interferometer, we obtain interference fringes in a Mach-Zehnder geometry in an unmodified 200 kV transmission electron microscope. The fringes have a period of 0.32 nm, which corresponds to the [111] lattice planes of silicon, and a maximum contrast of 15%. We use convergent-beam electron diffraction to quantify grating alignment and coherence. This design can potentially be scaled to millimeter-scale, and used in electron holography. It could also be applied to perform fundamental physics experiments, such as interactionfree measurement with electrons. |
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Language
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English
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Source (journal)
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Scientific reports. - London, 2011, currens
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Publication
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London
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Nature Publishing Group
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2017
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ISSN
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2045-2322
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DOI
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10.1038/S41598-017-01466-0
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Volume/pages
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7
(2017)
, 10 p.
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Article Reference
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1677
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ISI
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000400886100017
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Pubmed ID
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28490745
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Medium
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E-only publicatie
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Full text (Publisher's DOI)
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Full text (open access)
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