Publication
Title
Electron relaxation times and resistivity in metallic nanowires due to tilted grain boundary planes
Author
Abstract
Language
English
Source (journal)
2015 JOINT INTERNATIONAL EUROSOI WORKSHOP AND INTERNATIONAL CONFERENCE
ON ULTIMATE INTEGRATION ON SILICON (EUROSOI-ULIS)
Source (book)
2015 Joint International EUROSOI Workshop and International Conference, on Ultimate Integration on Silicon, JAN 26-28, 2015, Bologna, ITALY
Publication
New york : Ieee, 2015
ISBN
978-1-4799-6911-1
Volume/pages
(2015), p. 201-204
ISI
000380427400051
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 16.08.2017
Last edited 26.11.2018
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