Publication
Title
Mechanisms for plasma cryogenic etching of porous materials
Author
Abstract
Language
English
Source (journal)
Applied physics letters / American Institute of Physics. - New York, N.Y., 1962, currens
Publication
New York, N.Y. : American Institute of Physics, 2017
ISSN
0003-6951 [print]
1077-3118 [online]
Volume/pages
111:17(2017), 4 p.
Article Reference
173104
ISI
000413863400032
Full text (Publisher's DOI)
Full text (open access)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 20.11.2017
Last edited 28.09.2018
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