Publication
Title
Epitaxial CVD growth of ultra-thin Si passivation layers on strained Ge fin structures
Author
Abstract
Language
English
Source (journal)
SEMICONDUCTOR PROCESS INTEGRATION 10
Source (book)
Symposium on Semiconductor Process Integration 10 held during the 232nd, Meeting of the Electrochemical-Society (ECS), OCT 01-05, 2017, National Harbor, MD
Publication
Pennington : Electrochemical soc inc, 2017
ISBN
978-1-60768-821-1
978-1-62332-473-5
Volume/pages
80:4(2017), p. 241-252
ISI
000426269800024
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 29.03.2018
Last edited 18.07.2018
To cite this reference