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Epitaxial CVD growth of ultra-thin Si passivation layers on strained Ge fin structures
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| Abstract |
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English
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SEMICONDUCTOR PROCESS INTEGRATION 10 | |
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Symposium on Semiconductor Process Integration 10 held during the 232nd, Meeting of the Electrochemical-Society (ECS), OCT 01-05, 2017, National Harbor, MD | |
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Pennington : Electrochemical soc inc, 2017
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| ISBN |
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978-1-60768-821-1
978-1-62332-473-5
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80:4(2017), p. 241-252
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| ISI |
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000426269800024
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