Publication
Title
Importance of surface charging during plasma streamer propagation in catalyst pores
Author
Abstract
Plasma catalysis is gaining increasing interest, but the underlying mechanisms are far from understood. Different catalyst materials will have different chemical effects, but in addition, they might also have different dielectric constants, which will affect surface charging, and thus the plasma behavior. In this work, we demonstrate that surface charging plays an important role in the streamer propagation and discharge enhancement inside catalyst pores, and in the plasma distribution along the dielectric surface, and this role greatly depends on the dielectric constant of the material. For ε r ≤ 50, surface charging causes the plasma to spread along the dielectric surface and inside the pores, leading to deeper plasma streamer penetration, while for ε r > 50 or for metallic coatings, the discharge is more localized, due to very weak surface charging. In addition, at ε r = 50, the significant surface charge density near the pore entrance causes a large potential drop at the sharp pore edges, which induces a strong electric field and results in most pronounced plasma enhancement near the pore entrance.
Language
English
Source (journal)
Plasma sources science and technology / Institute of Physics [Londen] - Bristol, 1992, currens
Publication
Bristol : Institute of Physics , 2018
ISSN
0963-0252
Volume/pages
27 :6 (2018) , 8 p.
Article Reference
065009
ISI
000436845700002
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (open access)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Project info
Computer modelling and experimental validation of plasmas and plasma- surface interactions, for a deep insight in cryogenic etching (Cryoetch).
Multi-scale modeling of plasma catalysis/
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 18.07.2018
Last edited 02.09.2021
To cite this reference