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On the evolution of strain and electrical properties in as-grown and annealed Si:P epitaxial films for source-drain stressor applications
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| Abstract |
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| Language |
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English
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| Source (journal) |
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ECS journal of solid state science and technology / Electrochemical Society. - Pennington (N.J.), s.a. | |
| Publication |
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Pennington (N.J.) : Electrochemical society, 2018
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| ISSN |
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2162-8769
2162-8777
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| Volume/pages |
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7:5(2018), p. P228-P237
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| ISI |
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000440834200010
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