Publication
Title
Wet etching of TiN in 1-D and 2-D confined nano-spaces of FinFET transistors
Author
Abstract
Language
English
Source (journal)
Microelectronic engineering. - Amsterdam
Publication
Amsterdam : 2018
ISSN
0167-9317
Volume/pages
200(2018), p. 56-61
ISI
000449134800010
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 10.12.2018
Last edited 29.06.2019
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