| Title |
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Wet etching of TiN in 1-D and 2-D confined nano-spaces of FinFET transistors
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| Abstract |
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| Language |
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English
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| Source (journal) |
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Microelectronic engineering. - Amsterdam | |
| Publication |
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Amsterdam : 2018
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| ISSN |
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0167-9317
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| Volume/pages |
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200(2018), p. 56-61
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| ISI |
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000449134800010
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