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Title
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Capacitive electrical asymmetry effect in an inductively coupled plasma reactor
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Author
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Abstract
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| The electrical asymmetry effect is realized by applying multiple frequency power sources (13.56 MHz and 27.12 MHz) to a capacitively biased substrate electrode in a specific inductively coupled plasma reactor. On the one hand, by adjusting the phase angle 8 between the multiple frequency power sources, an almost linear self-bias develops on the substrate electrode, and consequently the ion energy can be well modulated, while the ion flux stays constant within a large range of O. On the other hand, the plasma density and ion flux can be significantly modulated by tuning the inductive power supply, while only inducing a small change in the self-bias. Independent control of self-bias/ion energy and ion flux can thus be realized in this specific inductively coupled plasma reactor. |
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Language
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English
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Source (journal)
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Plasma sources science and technology / Institute of Physics [Londen] - Bristol, 1992, currens
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Publication
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Bristol
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Institute of Physics
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2018
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ISSN
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0963-0252
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DOI
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10.1088/1361-6595/AAD796
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Volume/pages
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27
:10
(2018)
, 8 p.
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Article Reference
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105019
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ISI
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000448434100001
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Medium
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E-only publicatie
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Full text (Publisher's DOI)
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Full text (open access)
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Full text (publisher's version - intranet only)
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