Publication
Title
Capacitive electrical asymmetry effect in an inductively coupled plasma reactor
Author
Abstract
The electrical asymmetry effect is realized by applying multiple frequency power sources (13.56 MHz and 27.12 MHz) to a capacitively biased substrate electrode in a specific inductively coupled plasma reactor. On the one hand, by adjusting the phase angle 8 between the multiple frequency power sources, an almost linear self-bias develops on the substrate electrode, and consequently the ion energy can be well modulated, while the ion flux stays constant within a large range of O. On the other hand, the plasma density and ion flux can be significantly modulated by tuning the inductive power supply, while only inducing a small change in the self-bias. Independent control of self-bias/ion energy and ion flux can thus be realized in this specific inductively coupled plasma reactor.
Language
English
Source (journal)
Plasma sources science and technology / Institute of Physics [Londen] - Bristol, 1992, currens
Publication
Bristol : Institute of Physics , 2018
ISSN
0963-0252
Volume/pages
27 :10 (2018) , 8 p.
Article Reference
105019
ISI
000448434100001
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (open access)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Project info
Computer modelling and experimental validation of plasmas and plasma- surface interactions, for a deep insight in cryogenic etching (Cryoetch).
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 10.12.2018
Last edited 04.09.2021
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