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Title
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Alternative Metals: from ab initio Screening to Calibrated Narrow Line Models
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Author
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Abstract
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| We discuss the selection and assessment of alternative metals by a combination of ab initio computation of electronic properties, experimental resistivity assessments, and calibrated line resistance models. Pt-group metals as well as Nb are identified as the most promising elements, with Ru showing the best combination of material properties and process maturity. An experimental assessment of the resistivity of Ru, Ir, and Co lines down to similar to 30 nm(2) is then used to devise compact models for line and via resistance that can be compared to Cu predictions. The main advantage of alternative metals originates from the possibility for barrierless metallization. |
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Language
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English
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Source (journal)
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Proceedings of the IEEE ... International Interconnect Technology Conference. - Piscataway, N.J, 1998, currens
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Source (book)
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IEEE International Interconnect Technology Conference (IITC), JUN 04-07, 2018, Santa Clara, CA
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Publication
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New york
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Ieee
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2018
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ISBN
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978-1-5386-4337-2
978-1-5386-4337-2
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DOI
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10.1109/IITC.2018.8456484
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Volume/pages
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(2018)
, p. 154-156
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ISI
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000468672900051
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Full text (Publisher's DOI)
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Full text (publisher's version - intranet only)
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