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Title
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Quantum transport study of contact resistance of edge- and top-contacted two-dimensional materials
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Author
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Abstract
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| We calculate the contact resistance for an edge- and top-contacted 2D semiconductor. The contact region consists of a metal contacting a monolayer of MoS2 which is otherwise surrounded by SiO2. We use the quantum transmitting boundary method to compute the contact resistance as a function of the 2D semiconductor doping concentration. An effective mass Hamiltonian is used to describe the properties of the various materials. The electrostatic potentials are obtained by solving the Poisson equation numerically. We incorporate the effects of the image-force barrier lowering on the Schottky barrier and examine the impact on the contact resistance. At low doping concentrations, the contact resistance of the top contact is lower compared to edge contact, while at high doping concentrations, the edge contact exhibits lower resistance. |
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Language
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English
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Source (journal)
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International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]. - Piscataway, NJ
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Source (book)
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International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 27-29, 2023, Kobe, Japan
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Publication
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New york
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Ieee
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2023
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ISBN
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978-4-86348-803-8
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DOI
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10.23919/SISPAD57422.2023.10319537
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Volume/pages
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(2023)
, p. 45-48
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ISI
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001117703800012
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Full text (Publisher's DOI)
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Full text (publisher's version - intranet only)
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