Publication
Title
Nitrogen and hydrogen in thick diamiond films grown by microwave plasma enhanced chemical vapor deposition at variable flow rates
Author
Language
English
Source (journal)
Journal of applied physics / American Institute of Physics. - New York, N.Y., 1937, currens
Publication
New York, N.Y. : American Institute of Physics, 2000
ISSN
0021-8979 [print]
1089-7550 [online]
Volume/pages
87(2000), p. 8741-8746
ISI
000087346400073
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 08.10.2008
Last edited 30.09.2017
To cite this reference