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Title
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Nitrogen and hydrogen in thick diamiond films grown by microwave plasma enhanced chemical vapor deposition at variable flow rates
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Author
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Language
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English
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Source (journal)
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Journal of applied physics / American Institute of Physics. - New York, N.Y., 1937, currens
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Publication
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New York, N.Y.
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American Institute of Physics
,
2000
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ISSN
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0021-8979
[print]
1089-7550
[online]
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DOI
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10.1063/1.373604
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Volume/pages
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87
(2000)
, p. 8741-8746
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ISI
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000087346400073
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Full text (Publisher's DOI)
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