Title
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering Modeling of the target surface modification by reactive ion implantation during magnetron sputtering
Author
Faculty/Department
Faculty of Sciences. Chemistry
Publication type
article
Publication
New York, N.Y. ,
Source (journal)
Journal of vacuum science and technology: A: vacuum surfaces and films. - New York, N.Y., 1983, currens
Volume/pages
22(2004) :4 , p. 1524-1529
ISSN
0734-2101
ISI
000223322000075
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
E-info
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Handle