Publication
Title
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering
Author
Language
English
Source (journal)
Journal of vacuum science and technology: A: vacuum surfaces and films. - New York, N.Y., 1983, currens
Publication
New York, N.Y. : 2004
ISSN
0734-2101
Volume/pages
22:4(2004), p. 1524-1529
ISI
000223322000075
Full text (Publishers DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 08.10.2008
Last edited 11.05.2017
To cite this reference