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Title
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Modeling of the target surface modification by reactive ion implantation during magnetron sputtering
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Author
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Language
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English
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Source (journal)
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Journal of vacuum science and technology: A: vacuum surfaces and films. - New York, N.Y., 1983, currens
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Publication
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New York, N.Y.
:
2004
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ISSN
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0734-2101
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DOI
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10.1116/1.1705641
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Volume/pages
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22
:4
(2004)
, p. 1524-1529
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ISI
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000223322000075
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Full text (Publisher's DOI)
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