Publication
Title
Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics
Author
Language
English
Source (journal)
Journal of applied physics / American Institute of Physics. - New York, N.Y., 1937, currens
Publication
New York, N.Y. : American Institute of Physics, 2005
ISSN
0021-8979 [print]
1089-7550 [online]
Volume/pages
98:2(2005), p. 023308,1-13
ISI
000230931500016
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 08.10.2008
Last edited 14.11.2017
To cite this reference