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Title
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Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics
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Author
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Language
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English
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Source (journal)
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Journal of applied physics / American Institute of Physics. - New York, N.Y., 1937, currens
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Publication
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New York, N.Y.
:
American Institute of Physics
,
2005
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ISSN
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0021-8979
[print]
1089-7550
[online]
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DOI
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10.1063/1.1989439
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Volume/pages
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98
:2
(2005)
, p. 023308,1-13
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ISI
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000230931500016
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Full text (Publisher's DOI)
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