Title
A microstructural study of the thermal stability of atomic layer deposited <tex>$Al_{2}O_{3}$</tex> thin films A microstructural study of the thermal stability of atomic layer deposited <tex>$Al_{2}O_{3}$</tex> thin films
Author
Faculty/Department
Faculty of Sciences. Physics
Publication type
article
Publication
Cambridge :IOP ,
Subject
Physics
Source (journal)
CONFERENCE SERIES- INSTITUTE OF PHYSICS
Source (book)
Microscopy of semiconducting materials
Volume/pages
(2003) , p. 397-400
ISSN
0951-3248
ISBN
0-7503-0979-2
ISI
000222976100091
Carrier
E
Target language
English (eng)
Affiliation
University of Antwerp
Abstract
The thermal stability of amorphous Al2O3 films (similar to8 and 80 nut thick) deposited by atomic layer deposition on HF-last and thin SiO2 covered (001) Si substrates is studied by transmission electron microscopy. The layers are in- and ex-situ annealed in the same temperature range.
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