Publication
Title
Thermal stability of atomic layer deposited Zr:Al mixed oxide thin films: an in situ transmission electron microscopy study
Author
Language
English
Source (journal)
Journal of materials research. - New York, N.Y.
Publication
New York, N.Y. : 2005
ISSN
0884-2914
Volume/pages
20:7(2005), p. 1741-1750
ISI
000230296100012
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 08.10.2008
Last edited 07.11.2017
To cite this reference