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Title
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Thermal stability of atomic layer deposited Zr:Al mixed oxide thin films: an in situ transmission electron microscopy study
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Author
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Language
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English
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Source (journal)
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Journal of materials research. - New York, N.Y., 1986, currens
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Publication
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New York, N.Y.
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2005
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ISSN
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0884-2914
[print]
2044-5326
[online]
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DOI
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10.1557/JMR.2005.0217
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Volume/pages
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20
:7
(2005)
, p. 1741-1750
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ISI
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000230296100012
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Full text (Publisher's DOI)
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