Title
Unraveling the deposition mechanism in a-C:H thin-film growth: a molecular-dynamics study for the reaction behavior of <tex>$C_{3}$</tex> and <tex>$C_{3}H$</tex> radicals with a-C:H surfaces Unraveling the deposition mechanism in a-C:H thin-film growth: a molecular-dynamics study for the reaction behavior of <tex>$C_{3}$</tex> and <tex>$C_{3}H$</tex> radicals with a-C:H surfaces
Author
Faculty/Department
Faculty of Sciences. Chemistry
Publication type
article
Publication
New York, N.Y. :American Institute of Physics ,
Source (journal)
Journal of applied physics / American Institute of Physics. - New York, N.Y., 1937, currens
Volume/pages
99(2006) :1 , p. 014902,1-8
ISSN
0021-8979
1089-7550
ISI
000234607200071
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
E-info
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