Publication
Title
Unraveling the deposition mechanism in a-C:H thin-film growth: a molecular-dynamics study for the reaction behavior of and radicals with a-C:H surfaces
Author
Language
English
Source (journal)
Journal of applied physics / American Institute of Physics. - New York, N.Y., 1937, currens
Publication
New York, N.Y. : American Institute of Physics, 2006
ISSN
0021-8979 [print]
1089-7550 [online]
Volume/pages
99:1(2006), p. 014902,1-8
ISI
000234607200071
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 08.10.2008
Last edited 10.06.2017
To cite this reference