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Title
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Unraveling the deposition mechanism in a-C:H thin-film growth: a molecular-dynamics study for the reaction behavior of and radicals with a-C:H surfaces
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Author
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Language
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English
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Source (journal)
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Journal of applied physics / American Institute of Physics. - New York, N.Y., 1937, currens
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Publication
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New York, N.Y.
:
American Institute of Physics
,
2006
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ISSN
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0021-8979
[print]
1089-7550
[online]
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DOI
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10.1063/1.2150149
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Volume/pages
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99
:1
(2006)
, p. 014902,1-8
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ISI
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000234607200071
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Full text (Publisher's DOI)
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