Publication
Title
Negative ion behavior in single- and dual-frequency plasma etching reactors: particle-in-cell/Monte Carlo collision study
Author
Language
English
Source (journal)
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics. - Lancaster, Pa, 1993 - 2000
Publication
Lancaster, Pa : 2006
ISSN
1063-651X [print]
1095-3787 [online]
Volume/pages
73:3(2006), p. 036402,1-9
ISI
000236467700081
Full text (Publisher's DOI)
Full text (open access)
UAntwerpen
Faculty/Department
Research group
Publication type
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 08.10.2008
Last edited 17.11.2017
To cite this reference