Title
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Negative ion behavior in single- and dual-frequency plasma etching reactors: particle-in-cell/Monte Carlo collision study
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Author
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Language
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English
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Source (journal)
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Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics. - Lancaster, Pa, 1993 - 2000
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Publication
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Lancaster, Pa
:
2006
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ISSN
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1063-651X
[print]
1095-3787
[online]
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DOI
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10.1103/PHYSREVE.73.036402
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Volume/pages
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73
:3
(2006)
, p. 036402,1-9
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ISI
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000236467700081
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Full text (Publisher's DOI)
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Full text (open access)
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