Title
Negative ion behavior in single- and dual-frequency plasma etching reactors: particle-in-cell/Monte Carlo collision studyNegative ion behavior in single- and dual-frequency plasma etching reactors: particle-in-cell/Monte Carlo collision study
Author
Faculty/Department
Faculty of Sciences. Chemistry
Research group
Plasma, laser ablation and surface modeling - Antwerp (PLASMANT)
Publication type
article
Publication
Lancaster, Pa,
Source (journal)
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics. - Lancaster, Pa, 1993 - 2000
Volume/pages
73(2006):3, p. 036402,1-9
ISSN
1063-651X
1095-3787
ISI
000236467700081
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
E-info
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Full text (open access)
https://repository.uantwerpen.be/docman/irua/db638e/10302.pdf
Handle