Publication
Title
Interpretation of TOF-SIMS depth profiles from ultrashallow high-**k** dielectric stacks assisted by hybrid collisional computer simulation
Author
Language
English
Source (journal)
Applied physics A: materials science & processing. - Heidelberg
Publication
Heidelberg : 2005
ISSN
0947-8396
Volume/pages
81:1(2005), p. 71-77
ISI
000228794000013
Full text (Publishers DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 08.10.2008
Last edited 14.05.2017
To cite this reference