Title
Interpretation of TOF-SIMS depth profiles from ultrashallow high-**k** dielectric stacks assisted by hybrid collisional computer simulationInterpretation of TOF-SIMS depth profiles from ultrashallow high-**k** dielectric stacks assisted by hybrid collisional computer simulation
Author
Faculty/Department
Faculty of Sciences. Chemistry
Research group
Plasma, laser ablation and surface modeling - Antwerp (PLASMANT)
Department of Chemistry
Publication type
article
Publication
Heidelberg,
Source (journal)
Applied physics A: materials science & processing. - Heidelberg
Volume/pages
81(2005):1, p. 71-77
ISSN
0947-8396
ISI
000228794000013
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
E-info
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