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Title
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Interpretation of TOF-SIMS depth profiles from ultrashallow high-**k** dielectric stacks assisted by hybrid collisional computer simulation
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Author
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Language
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English
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Source (journal)
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Applied physics A : materials science & processing. - Heidelberg, 1995, currens
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Publication
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Heidelberg
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Springer
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2005
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ISSN
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0947-8396
[print]
1432-0630
[online]
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DOI
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10.1007/S00339-005-3239-8
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Volume/pages
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81
:1
(2005)
, p. 71-77
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ISI
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000228794000013
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Full text (Publisher's DOI)
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