Publication
Title
TEM characterization of extended defects induced in Si wafers by H-plasma treatment
Author
Language
English
Source (journal)
Journal of physics: D: applied physics. - London
Publication
London : 2007
ISSN
0022-3727
Volume/pages
40:2(2007), p. 395-400
ISI
000243725800017
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 08.10.2008
Last edited 11.07.2017
To cite this reference