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Title
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TEM characterization of extended defects induced in Si wafers by H-plasma treatment
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Author
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Language
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English
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Source (journal)
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Journal of physics: D: applied physics. - London
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Publication
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London
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2007
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ISSN
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0022-3727
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DOI
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10.1088/0022-3727/40/2/016
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Volume/pages
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40
:2
(2007)
, p. 395-400
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ISI
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000243725800017
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Full text (Publisher's DOI)
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