Publication
Title
Dynamics of nanoclustering in Te+ implanted Si after application of high frequency electromagnetic field and thermal annealing
Author
Language
English
Source (journal)
Applied physics A: materials science & processing. - Heidelberg
Publication
Heidelberg : 2008
ISSN
0947-8396
Volume/pages
91:3(2008), p. 515-519
ISI
000255089300027
Full text (Publishers DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 08.10.2008
Last edited 25.03.2017
To cite this reference