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Title
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Dynamics of nanoclustering in Te+ implanted Si after application of high frequency electromagnetic field and thermal annealing
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Author
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Language
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English
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Source (journal)
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Applied physics A : materials science & processing. - Heidelberg, 1995, currens
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Publication
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Heidelberg
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Springer
,
2008
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ISSN
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0947-8396
[print]
1432-0630
[online]
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DOI
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10.1007/S00339-008-4441-2
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Volume/pages
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91
:3
(2008)
, p. 515-519
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ISI
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000255089300027
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Full text (Publisher's DOI)
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