Title
High-performance x-ray silicon detector for reliable industrial and research XRF applications High-performance x-ray silicon detector for reliable industrial and research XRF applications
Author
Faculty/Department
Faculty of Sciences. Chemistry
Publication type
article
Publication
London ,
Subject
Chemistry
Source (journal)
X-ray spectrometry. - London
Volume/pages
34(2005) :5 , p. 417-420
ISSN
0049-8246
ISI
000232124900005
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
Abstract
In quantitative analysis, instrument stability is a mandatory requirement. The stability of resolution, sensitivity and gain versus count rate, temperature and time are the key considerations in instrument performance. A careful study of the stability of an x-ray spectrometry system consisting of an x-ray detector and digital spectroscopy analyser was performed. As a new approach, resolution and throughput are presented versus dead time. To test the stability of resolution, gain and sensitivity versus time, hundreds of spectra were acquired over almost 4 days. The average resolution was 179.9 eV (RSD 0.67%). The gain variation during this experiment was found to be 0.13 eV at the 5.895 keV Mn K. The uncertainty contribution of the detector on the peak intensity was found to be RSD 0.0651%. The gain and sensitivity data showed a very small trend with changing ambient temperature. The experiment was repeated at constant ambient temperature, concluding that no statistically significant drift of peak intensity could be observed in that condition.
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