Publication
Title
Reactive sputter deposition of films, simulated with a particle-in-cell/Monte Carlo collisions model
Author
Abstract
The physical processes in an Ar/N2 magnetron discharge used for the reactive sputter deposition of TiNx thin films were simulated with a 2d3v particle-in-cell/Monte Carlo collisions (PIC/MCC) model. Cathode currents and voltages were calculated self-consistently and compared with experiments. Also, ion fractions were calculated and validated with mass spectrometric measurements. With this PIC/MCC model, the influence of N2/Ar gas ratio on the particle densities and fluxes was investigated, taking into account the effect of the poisoned state of the target.
Language
English
Source (journal)
New journal of physics / Institute of Physics; German Physical Society. - Bristol
Publication
Bristol : 2009
ISSN
1367-2630
Volume/pages
11(2009), p. 023039,1-023039,24
ISI
000263744100001
Full text (Publisher's DOI)
Full text (open access)
UAntwerpen
Faculty/Department
Research group
[E?say:metaLocaldata.cgzprojectinf]
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 26.02.2009
Last edited 01.11.2017
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