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Title
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Reactive sputter deposition of films, simulated with a particle-in-cell/Monte Carlo collisions model
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Author
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Abstract
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| The physical processes in an Ar/N2 magnetron discharge used for the reactive sputter deposition of TiNx thin films were simulated with a 2d3v particle-in-cell/Monte Carlo collisions (PIC/MCC) model. Cathode currents and voltages were calculated self-consistently and compared with experiments. Also, ion fractions were calculated and validated with mass spectrometric measurements. With this PIC/MCC model, the influence of N2/Ar gas ratio on the particle densities and fluxes was investigated, taking into account the effect of the poisoned state of the target. |
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Language
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English
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Source (journal)
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New journal of physics / Institute of Physics [Londen]; German Physical Society. - Bristol
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Publication
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Bristol
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2009
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ISSN
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1367-2630
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DOI
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10.1088/1367-2630/11/2/023039
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Volume/pages
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11
(2009)
, p. 023039,1-023039,24
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ISI
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000263744100001
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Full text (Publisher's DOI)
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Full text (open access)
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