Title
Reactive sputter deposition of <tex>$TiN_{x}$</tex> films, simulated with a particle-in-cell/Monte Carlo collisions model Reactive sputter deposition of <tex>$TiN_{x}$</tex> films, simulated with a particle-in-cell/Monte Carlo collisions model
Author
Faculty/Department
Faculty of Sciences. Chemistry
Publication type
article
Publication
Bristol ,
Subject
Physics
Chemistry
Source (journal)
New journal of physics / Institute of Physics; German Physical Society. - Bristol
Volume/pages
11(2009) , p. 023039,1-023039,24
ISSN
1367-2630
ISI
000263744100001
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
Abstract
The physical processes in an Ar/N2 magnetron discharge used for the reactive sputter deposition of TiNx thin films were simulated with a 2d3v particle-in-cell/Monte Carlo collisions (PIC/MCC) model. Cathode currents and voltages were calculated self-consistently and compared with experiments. Also, ion fractions were calculated and validated with mass spectrometric measurements. With this PIC/MCC model, the influence of N2/Ar gas ratio on the particle densities and fluxes was investigated, taking into account the effect of the poisoned state of the target.
Full text (open access)
https://repository.uantwerpen.be/docman/irua/4628e9/84fc88f1.pdf
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