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Title
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Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments
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Author
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Abstract
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| Using a molecular dynamics model the crystallinity of MgxAlyOz thin films with a variation in the stoichiometry of the thin film is studied at operating conditions similar to the experimental operating conditions of a dual magnetron sputter deposition system. The films are deposited on a crystalline or amorphous substrate. The Mg metal content in the film ranged from 100% (i.e. MgO film) to 0% (i.e. Al2O3 film). The radial distribution function and density of the films are calculated. The results are compared with x-ray diffraction and transmission electron microscopy analyses of experimentally deposited thin films by the dual magnetron reactive sputtering process. Both simulation and experimental results show that the structure of the MgAlO film varies from crystalline to amorphous when the Mg concentration decreases. It seems that the crystalline MgAlO films have a MgO structure with Al atoms in between. |
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Language
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English
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Source (journal)
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Journal of physics: D: applied physics. - London
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Publication
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London
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2009
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ISSN
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0022-3727
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DOI
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10.1088/0022-3727/42/6/065107
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Volume/pages
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42
:6
(2009)
, p. 065107,1-065107,8
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ISI
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000263824200024
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Full text (Publisher's DOI)
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