Publication
Title
Modeling of chemical processes in the low pressure capacitive radio frequency discharges in a mixture of Ar/
Author
Abstract
Language
English
Source (journal)
Journal of applied physics / American Institute of Physics. - New York, N.Y., 1937, currens
Publication
New York, N.Y. : American Institute of Physics, 2009
ISSN
0021-8979 [print]
1089-7550 [online]
Volume/pages
105:6(2009), p. 063305,1-063305,9
ISI
000264774000059
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
E-info
Record
Identification
Creation 03.04.2009
Last edited 09.10.2018
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