Publication
Title
Investigation of etching and deposition processes of inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments
Author
Abstract
Language
English
Source (journal)
Journal of physics: D: applied physics. - London
Publication
London : 2009
ISSN
0022-3727
Volume/pages
42(2009), p. 095204,1-095204,13
ISI
000265531000030
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
Project info
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 27.04.2009
Last edited 17.08.2018
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