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Title
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Fabrication and characterization of functionally graded Ni-Ti multilayer thin films
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Author
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Abstract
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| A functionally graded multilayer NiTi thin film was deposited on a SiO2/Si substrate by d.c. sputtering using a ramped heated NiTi alloy target. The stand-alone films were crystallized at 500°C in vacuum better than 10-7 Torr. Transmission electron microscopy micrographs taken along the film cross section show two distinct regions, thin and thick, with weak R and B2 phases, respectively. The film compositions along the thickness were measured and quantified using the standard-less EELSMODEL method. The film deposited during the initial thermal ramp (thin regions) displays an average of 54 at.% Ni while the film deposited at a more elevated target temperature (thick regions) shows about 51 at.% Ni. |
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Language
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English
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Source (journal)
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Functional materials letters
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Publication
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2009
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DOI
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10.1142/S1793604709000570
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Volume/pages
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2
:2
(2009)
, p. 61-66
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ISI
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000271077000003
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Full text (Publisher's DOI)
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Full text (publisher's version - intranet only)
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