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Fabrication and characterization of functionally graded Ni-Ti multilayer thin films
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| Author |
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| Abstract |
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| A functionally graded multilayer NiTi thin film was deposited on a SiO2/Si substrate by d.c. sputtering using a ramped heated NiTi alloy target. The stand-alone films were crystallized at 500°C in vacuum better than 10-7 Torr. Transmission electron microscopy micrographs taken along the film cross section show two distinct regions, thin and thick, with weak R and B2 phases, respectively. The film compositions along the thickness were measured and quantified using the standard-less EELSMODEL method. The film deposited during the initial thermal ramp (thin regions) displays an average of 54 at.% Ni while the film deposited at a more elevated target temperature (thick regions) shows about 51 at.% Ni. | |
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English
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| Source (journal) |
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Functional materials letters |
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2009
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2:2(2009), p. 61-66
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| ISI |
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000271077000003
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| Full text (publisher's version - intranet only) |
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